INFORMATION ABOUT THE TALENTED STUDENTS SELECTION PROGRAM 2025 – 2026
Selection fields:
- STEM – Engineering & Making: Students with a strong passion for technological solutions, ranging from hardware (robotics, electronics, engineering design, materials, etc.) to software (programming, app development, AI, data science, etc.). They believe that many of the world’s challenges can be addressed through technology and are eager to learn, explore, and develop innovative solutions to those problems.
- STEM – Scientific Research: Students who are deeply interested in natural phenomena and the scientific processes used to investigate and explain them through subjects such as Physics, Chemistry, Biology, or interdisciplinary studies. They aspire to engage with advanced knowledge, conduct research in modern laboratory environments, and contribute to the broader body of scientific knowledge.
- Social Sciences: Students who demonstrate a strong interest in various aspects of society, including history, culture, economics, social life, and the interconnections among them that shape today’s world. They seek to explore social phenomena in depth and from multiple perspectives, with the aim of interpreting these phenomena and contributing positive impacts through community-based or social initiatives.
- Literature: Students who view language—particularly literature—as a powerful medium for understanding and expressing life. They are sensitive to language, passionate about reading and writing, and eager to develop literary thinking and practice. This may include creative writing and literary creation, and/or the analysis and critique of literary works.
Selection rounds and tentative timeline:
- Preliminary Round: 05/01/2026 – 26/01/2026
Candidates register via the application link and submit 01 Talent Portfolio, which must be prepared in advance. This portfolio includes essential documents and evidence for application submission—in other words, it is an opportunity for students to fully showcase their talents, passions, individuality, and unique strengths.
Parents and Students are kindly requested to refer to the Application Guidebook for the Selection Program HERE.
Accordingly, the Talent Portfolio includes:
- Curriculum Vitae (CV): A self-introduction in which students share personal information, activities, projects participated in, and awards related to the applied field.
- Talent Evidence (Portfolio): A compilation of supporting materials (soft copies – unlimited in number) demonstrating students’ capabilities in the applied field.
- Personal Statement: An essay expressing the student’s passion, individuality, and interest in the chosen field. Through this, GATE Center can recognize how the student stands out compared to other candidates and better understand the student’s personal orientation toward the field.
Note: Each field has specific requirements for essays and portfolios. Parents and Students are advised to carefully review the Application Guidebook to prepare the most appropriate materials.
After reviewing the applications, the Organizing Committee will contact the most promising candidates to participate in the Evaluation Round.
- Evaluation Round: March – April 2026
Candidates who pass the Preliminary Round will participate in different assessment components, enabling GATE Center to conduct the most comprehensive, multi-dimensional evaluation of candidates’ knowledge, capabilities, and passion in their applied field. Detailed information and participation guidelines for the Evaluation Round will be sent to candidates after the Preliminary Round concludes.
- Interview Round: April 2026
This round aims to create opportunities for direct interaction between the Jury Panel and candidates, allowing for a deeper understanding of each student. Through face-to-face engagement, GATE Center will explore students’ aspirations, needs, and suitability for the Center’s training orientation. As a result, GATE Center can provide the most accurate and comprehensive assessment of candidates’ capabilities and passion for their applied field.
